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Title:
MICROBUBBLE GENERATION NOZZLE, METHOD FOR INCORPORATING BUBBLES THAT INCLUDE MICROBUBBLES INTO LIQUID USING MICROBUBBLE GENERATION NOZZLE, BIOLOGICAL REACTION DEVICE COMPRISING MICROBUBBLE GENERATION NOZZLE, AND MICROBUBBLE GENERATION NOZZLE DEVICE COMPRISING PLURALITY OF MICROBUBBLE GENERATION NOZZLES
Document Type and Number:
WIPO Patent Application WO/2019/187039
Kind Code:
A1
Abstract:
The present invention addresses: the problem of providing a microbubble generation nozzle that has a simple form and structure and makes it possible to improve the efficiency with which microbubbles are generated and to efficiently and substantially increase the microbubble content of a liquid; the problem of providing a method for incorporating bubbles that include microbubbles into a liquid using the microbubble generation nozzle; the problem of providing a biological reaction device that comprises the microbubble generation nozzle; and the problem of providing a microbubble generation nozzle device that comprises a plurality of the microbubble generation nozzles. This microbubble generation nozzle supplies a gas into a liquid that is flowing through a nozzle main body. The gas is supplied through a slit that is continuously provided in a side surface along a plane that is orthogonal to the center axis of the nozzle main body, which makes it possible to improve the efficiency with which microbubbles are generated and to efficiently and substantially increase the microbubble content of the liquid.

Inventors:
HIGUCHI, Masamori (1-2-2 Nihonbashi-Hongokucho, Chuo-k, Tokyo 21, 〒1030021, JP)
KUNITOMO, Nobuhide (1-2-2 Nihonbashi-Hongokucho, Chuo-k, Tokyo 21, 〒1030021, JP)
IKARI, Kenji (1-2-2 Nihonbashi-Hongokucho, Chuo-k, Tokyo 21, 〒1030021, JP)
SHINTANI, Etsurou (1-2-2 Nihonbashi-Hongokucho, Chuo-k, Tokyo 21, 〒1030021, JP)
Application Number:
JP2018/013730
Publication Date:
October 03, 2019
Filing Date:
March 30, 2018
Export Citation:
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Assignee:
MITSUBISHI CHEMICAL ENGINEERING CORPORATION (1-2-2, Nihonbashi-Hongokucho Chuo-k, Tokyo 21, 〒1030021, JP)
International Classes:
B01F3/04; B01F5/00; C02F3/20
Domestic Patent References:
WO2008038763A12008-04-03
Foreign References:
JPH08290192A1996-11-05
JP2012524650A2012-10-18
JPH05252848A1993-10-05
JP2017018939A2017-01-26
JP2002153741A2002-05-28
JP2006181449A2006-07-13
Attorney, Agent or Firm:
KOBAYASHI, Hitoshi et al. (Mutsumi Int. Patent Bureau, p.c. Tousen kanda sudacho Bldg.9F, 28, Kanda-sudacho 1-chome, Chiyoda-k, Tokyo 41, 〒1010041, JP)
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