MICROCHANNEL DEVICE AND METHOD FOR MANUFACTURING SAME

WIPO Patent Application WO/2013/105574

A1

Proposed are a microchannel device (2) capable of maintaining desired characteristics in a channel space (14) and preventing a failure due to joining of a channel groove (23) in a first substrate (7) and a second substrate (8), and a method for manufacturing the same. Since a first self-assembled monomolecular film (21a) is not formed in the channel groove in the microchannel device, the characteristics of the materials themselves of first electrodes (11a, 11b, 11c) and a channel formation layer (12) can be maintained in the channel space without change in characteristics such as wettability, surface free energy, and a surface functional group in the channel groove, and joining with the second substrate can be reliably performed by only a joint surface (20a) except the channel groove, thereby making it possible to prevent the failure due to joining of the channel groove in the first substrate and the second substrate.

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KASAHARA TAKASHI (JP)
MIZUNO JUN (JP)
SYOJI SHUICHI (JP)
EDURA TOMOHIKO (JP)
MATSUNAMI SHIGEYUKI (JP)
ADACHI CHIHAYA (JP)

PCT/JP2013/050194

July 18, 2013

January 09, 2013

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UNIV KYUSHU (JP)
TOKYO ELECTRON LTD (JP)

B81B1/00; B01J19/00; B81C3/00; G01N37/00

WO2008149820A1

2008-12-11

JP2007075950A	2007-03-29
JP2003159787A	2003-06-03

YOSHIDA TADANORI (JP)
Yoshida Justice (JP)

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