Title:
MICROELECTRONIC CLEANING COMPOSITIONS CONTAINING OXIDIZERS AND ORGANIC SOLVENTS
Document Type and Number:
WIPO Patent Application WO2003104900
Kind Code:
A3
Abstract:
Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain an oxidizing agent and a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols, and optionally other components.
Inventors:
HSU CHIEN-PIN SHERMAN (US)
Application Number:
PCT/US2003/016828
Publication Date:
February 19, 2004
Filing Date:
May 27, 2003
Export Citation:
Assignee:
MALLINCKRODT BAKER INC (US)
HSU CHIEN-PIN SHERMAN (US)
HSU CHIEN-PIN SHERMAN (US)
International Classes:
C11D1/00; C11D3/20; C11D3/24; C11D3/28; C11D3/33; C11D3/34; C11D3/39; C11D7/06; C11D7/50; C11D11/00; C23G1/06; G03F7/42; H01L21/02; H01L21/027; H01L21/304; H01L21/311; C11D7/26; C11D7/28; C11D7/32; C11D7/34; (IPC1-7): G03F7/42
Foreign References:
| US5037724A | 1991-08-06 | |||
| EP1035446A2 | 2000-09-13 |
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