Title:
Microlithography projection objective with crystalelements
Document Type and Number:
WIPO Patent Application WO2005059645
Kind Code:
A9
Abstract:
A microlithography projection objective is proposed with optical elements, i.e. lenses or planar-parallel plates (used as end-closure plates) of crystalline magnesium fluoride, quartz, lanthanum fluoride, sapphire and Alpha-aluminium oxide. Suitable crystallographic orientations, crystal 10 combinations, and polarizations of the light are described. Suitable applications are for immersion lithography or near-field lithography in the DUV and VLN range, using the highest numerical aperture values.
Inventors:
SCHUSTER KARL-HEINZ (DE)
Application Number:
PCT/EP2004/014100
Publication Date:
June 08, 2006
Filing Date:
December 10, 2004
Export Citation:
Assignee:
ZEISS CARL SMT AG (DE)
SCHUSTER KARL-HEINZ (DE)
SCHUSTER KARL-HEINZ (DE)
International Classes:
G02B19/00; G02B13/14; G03F7/20
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