Title:
MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
Document Type and Number:
WIPO Patent Application WO/2011/057046
Kind Code:
A3
Abstract:
An interspinous process spacer (100) for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body (110), first, second, thirt and fourth deployable protrusions (122,124,126,128). The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and an expanded configuration. The first and second deployable protrusions are mounted proximate the proximal end and the third and fourth deployable protrusions are mounted proximate the distal end. The deployable protrusions are oriented generally parallel to the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.
Inventors:
THOMMEN DANIEL (CH)
WEBER MARKUS (CH)
TEISEN JACQUES (CH)
KRAFT MARKUS (CH)
KAUFMANN FLORIAN (CH)
HUNZIKER MARKUS (CH)
ASCHMANN FELIX (CH)
SALADIN STEFAN (CH)
OSWALD MARTIN (CH)
RANDEGGER ROMAN (CH)
WEBER MARKUS (CH)
TEISEN JACQUES (CH)
KRAFT MARKUS (CH)
KAUFMANN FLORIAN (CH)
HUNZIKER MARKUS (CH)
ASCHMANN FELIX (CH)
SALADIN STEFAN (CH)
OSWALD MARTIN (CH)
RANDEGGER ROMAN (CH)
Application Number:
PCT/US2010/055572
Publication Date:
June 30, 2011
Filing Date:
November 05, 2010
Export Citation:
Assignee:
SYNTHES USA LLC (US)
SYNTHES GMBH (CH)
THOMMEN DANIEL (CH)
WEBER MARKUS (CH)
TEISEN JACQUES (CH)
KRAFT MARKUS (CH)
KAUFMANN FLORIAN (CH)
HUNZIKER MARKUS (CH)
ASCHMANN FELIX (CH)
SALADIN STEFAN (CH)
OSWALD MARTIN (CH)
RANDEGGER ROMAN (CH)
SYNTHES GMBH (CH)
THOMMEN DANIEL (CH)
WEBER MARKUS (CH)
TEISEN JACQUES (CH)
KRAFT MARKUS (CH)
KAUFMANN FLORIAN (CH)
HUNZIKER MARKUS (CH)
ASCHMANN FELIX (CH)
SALADIN STEFAN (CH)
OSWALD MARTIN (CH)
RANDEGGER ROMAN (CH)
International Classes:
A61B17/70
Domestic Patent References:
| WO2005009300A1 | 2005-02-03 |
Foreign References:
| US20080177306A1 | 2008-07-24 |
Other References:
See also references of EP 2496159A2
Attorney, Agent or Firm:
AARONSON, Lawrence A. et al. (LLC12850 Highway 9,Suite 600 - PMB 33, Alpharetta Georgia, US)
Download PDF:
Previous Patent: MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
Next Patent: PROCESS FOR ANISOTROPIC ETCHING OF SEMICONDUCTORS
Next Patent: PROCESS FOR ANISOTROPIC ETCHING OF SEMICONDUCTORS