Title:
MIRROR DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2014/050035
Kind Code:
A1
Abstract:
In the etching of a SiO2 film (240) of an outer circumferential portion (255) of an actuator main body portion (251), the SiO2 film (240) is left on the surface of the actuator main body portion (251) in a state wherein the film protrudes further toward the outer side than a piezoelectric element (4). In the etching performed by forming a third resist mask (330) that covers the actuator main body portion (251) and a mirror portion (252), the third resist mask (330) has a second slit (332) having an outer circumferential portion (256) of the mirror portion (252) exposed therefrom, and a first slit (331), which has the outer circumferential portion (256) of the actuator main body portion (251) and the SiO2 film (240) of the actuator main body portion (251) exposed therefrom, and which is wider than the second slit (332).
Inventors:
MISAKI TOKIKO (JP)
Application Number:
PCT/JP2013/005533
Publication Date:
April 03, 2014
Filing Date:
September 19, 2013
Export Citation:
Assignee:
SUMITOMO PRECISION PROD CO (JP)
International Classes:
B81C1/00; G02B26/08
Domestic Patent References:
| WO2003062899A1 | 2003-07-31 |
Foreign References:
| JP2009154264A | 2009-07-16 | |||
| JP2009222900A | 2009-10-01 | |||
| JP2011227216A | 2011-11-10 |
Other References:
See also references of EP 2902835A4
Attorney, Agent or Firm:
MAEDA & PARTNERS (JP)
Patent business corporation MAEDA PATENT OFFICE (JP)
Patent business corporation MAEDA PATENT OFFICE (JP)
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