Title:
MITIGATION OF MULTILAYER DEFECTS ON A RETICLE
Document Type and Number:
WIPO Patent Application WO2002027404
Kind Code:
A8
Abstract:
A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. Thiscan be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film,producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflectedfield. For example, when the structural modification is a localized film contraction, the repairof a defect consists of flattening a mound or spreading out the sides of a depression.
More Like This:
Inventors:
STEARNS DANIEL G
SWEENEY DONALD W
MIRKARIMI PAUL B
SWEENEY DONALD W
MIRKARIMI PAUL B
Application Number:
PCT/US2001/027665
Publication Date:
August 07, 2003
Filing Date:
September 05, 2001
Export Citation:
Assignee:
UNIV CALIFORNIA (US)
International Classes:
G02B5/08; G02B5/28; G02B27/32; G03F1/72; H01L21/027; (IPC1-7): G03F1/14; G02B5/08; G03F1/00
Download PDF:
Previous Patent: METHOD OF COMPENSATING FLARE-INDUCED CD CHANGES
Next Patent: ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
Next Patent: ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY