MIXED SINTERED COMPACT OF SILICON AND SILICON DIOXIDE AND METHOD FOR PREPARATION THEREOF

WIPO Patent Application WO/2003/018506

A1

A mixed sintered compact of silicon and silicon dioxide, which is prepared from a silicon powder and a silicon dioxide powder and has a bulk density which is 75 % or more relative to that to be obtained when the raw material powders are packed at 0 % porosity and a Vickers hardness of 100 or more&semi and a method for preparing the mixed sintered compact of silicon and silicon dioxide which comprises mixing a silicon powder and a silicon dioxide powder, and then pressing and sintering the mixed material under vacuum, at a pressure of a press of 15 to 20 MPa, at a temperature of 1350 to 1420&ring C, and for a period of one hour or more. The mixed sintered compact has an advantage of the use of a silicon powder and a silicon dioxide powder as raw materials, and also exhibits an enhanced speed in the formation of a silicon monoxide vapor deposition film, is significantly reduced in the occurrence of splashing and is almost free from cracking or chipping even when it is machined into a desired shape.

NATSUME YOSHITAKE (JP)
OGASAWARA TADASHI (JP)
IWASE TOSHIHARU (JP)

PCT/JP2002/006882

March 06, 2003

July 05, 2002

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SUMITOMO TITANIUM CORP (JP)
NATSUME YOSHITAKE (JP)
OGASAWARA TADASHI (JP)
IWASE TOSHIHARU (JP)

C04B35/14; C04B35/645; C23C14/10; (IPC1-7): C04B35/14; C23C14/24

JPS63310961A	1988-12-19
JPH07310177A	1995-11-28
JPH0657417A	1994-03-01
JPH09143689A	1997-06-03
JPH09143690A	1997-06-03

Ikejyo, Shigenobu (3-3 Fushimimachi 3-chome, Chuou-ku, Chuou-k, Osaka-shi Osaka, JP)

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