MO-W TARGET AND METHOD FOR MANUFACTURING SAME

WIPO Patent Application WO/2013/038668

A1

[Problem] To provide a Mo-W target capable of improving relative density without performing a rolling process, and a method for manufacturing the Mo-W target. [Solution] A molybdenum powder is subjected to a deoxidation process at a temperature of 1100 to 1300°C inclusive, tungsten powder is mixed with the deoxidized molybdenum powder, and the mixture of the molybdenum powder and the tungsten powder is sintered under pressure at a predetermined temperature. As a consequence thereof, fewer voids are generated during sintering, and the density of sintered bodies is increased. Therefore, the abovementioned manufacturing method makes it possible to achieve higher densities without performing a rolling process, making it possible to achieve uniform film thickness when sputtering is used to form a film.

MA WENPING (JP)
MATSUMOTO HIROSHI (JP)
NITTA JUNICHI (JP)
KIYOTA JUNYA (JP)
TAKEI MASAKI (JP)
SAKAMOTO JUNICHI (JP)

PCT/JP2012/005812

March 21, 2013

September 13, 2012

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ULVAC INC (JP)
MA WENPING (JP)
MATSUMOTO HIROSHI (JP)
NITTA JUNICHI (JP)
KIYOTA JUNYA (JP)
TAKEI MASAKI (JP)
SAKAMOTO JUNICHI (JP)

C23C14/34; B22F1/00; B22F3/15; C22C27/04

JP2000045066A	2000-02-15
JP2004217990A	2004-08-05
JP2008280570A	2008-11-20
JP2005307225A	2005-11-04

OMORI, JUNICHI (JP)
Omori Junichi (JP)

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