Title:
MODIFICATION OF PARTICLES FOR ADDITIVE MANUFACTURING
Document Type and Number:
WIPO Patent Application WO/2020/014287
Kind Code:
A3
Abstract:
Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) provide precise and conformal coatings that are employed to modify the properties of powders for additive manufacturing (AM). We have surprisingly discovered that use of a limited number of ALD cycles can impart improved flowability. In various aspects, the coating may provide one or more advantages such as novel material properties, increased flowability, improved sintering, enhanced stability during storage, and prevention of premature sintering.
Inventors:
BARNES JOHN (US)
BUECHLER KAREN (US)
GUMP CHRISTOPHER (US)
HIGGS DANIEL (US)
NELSON PAUL (US)
SIMMONS WAYNE (US)
BUECHLER KAREN (US)
GUMP CHRISTOPHER (US)
HIGGS DANIEL (US)
NELSON PAUL (US)
SIMMONS WAYNE (US)
Application Number:
PCT/US2019/041089
Publication Date:
February 13, 2020
Filing Date:
July 09, 2019
Export Citation:
Assignee:
ALD NANOSOLUTIONS INC (US)
International Classes:
B22F1/102; B22F1/145; B22F1/16; B22F3/00; B22F3/105; B33Y70/00; C04B35/628
Foreign References:
| EP3260223A1 | 2017-12-27 | |||
| US20180051376A1 | 2018-02-22 | |||
| US6613383B1 | 2003-09-02 |
Attorney, Agent or Firm:
ROSENBERG, Frank (US)
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