Title:
MODIFIED POLYAMIDEIMIDE RESIN, ELECTRICALLY INSULATING MATERIAL, METHOD FOR IMPROVING DIELECTRIC BREAKDOWN RESISTANCE OF INSULATING LAYER, AND INSULATED WIRE
Document Type and Number:
WIPO Patent Application WO/2011/152364
Kind Code:
A1
Abstract:
Disclosed is a method for improving the dielectric breakdown resistance of an insulating layer, which is applied for the purpose of improving the dielectric breakdown resistance of an insulating layer that is provided on a conductor. The method for improving the dielectric breakdown resistance of an insulating layer is characterized by forming the insulating layer by coating the conductor with an electrically insulating material, which contains at least one kind of a modified polyamideimide resin that is selected from the group 1 and the group 2 mentioned below, and baking the electrically insulating material thereon.
Group 1: modified polyamideimide resins which are obtained by causing a tricarboxylic acid anhydride or a derivative thereof and a diisocyanate compound or a diamino compound to react with each other in the presence of at least one polybutadiene resin or a hydrogenated product thereof
Group 2: modified polyamideimide resins which are obtained by mixing at least one polybutadiene resin or a hydrogenated product thereof and a polyamideimide resin
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Inventors:
ZHONG Huifeng (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
鐘 慧峰 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
OOKAWARA Toshikazu (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
大川原 敏一 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
鐘 慧峰 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
OOKAWARA Toshikazu (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
大川原 敏一 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
Application Number:
JP2011/062419
Publication Date:
December 08, 2011
Filing Date:
May 30, 2011
Export Citation:
Assignee:
HITACHI CHEMICAL COMPANY, LTD. (1-1 Nishi-Shinjuku 2-chome, Shinjuku-ku Tokyo, 49, 〒1630449, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
ZHONG Huifeng (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
鐘 慧峰 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
OOKAWARA Toshikazu (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
ZHONG Huifeng (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
鐘 慧峰 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
OOKAWARA Toshikazu (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
International Classes:
C08G73/10; C08G18/65; C08L47/00; C08L79/08; C09D5/25; C09D109/00; C09D179/08; H01B3/30; H01B7/02
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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Claims: