Title:
MOISTURE-DRYING MASK SYSTEM PROVIDED WITH ABSORBING LAYER
Document Type and Number:
WIPO Patent Application WO/2023/211127
Kind Code:
A1
Abstract:
The present invention relates to a moisture-drying mask system with an absorbing layer. Disclosed is a technical idea of a mask system that selectively covers the face of a wearer, comprising: a fiber filtering unit that covers a certain area of the face of the wearer and filters certain particles according to the breath of the wearer; and an absorbing layer unit that is selectively provided on the inner surface of the fiber filtering unit and selectively absorbs moisture present in the inner space of the fiber filtering unit.
Inventors:
CHOI HWOA IN (KR)
Application Number:
PCT/KR2023/005633
Publication Date:
November 02, 2023
Filing Date:
April 25, 2023
Export Citation:
Assignee:
CHOI HWOA IN (KR)
International Classes:
A62B9/00; A62B23/02
Foreign References:
| KR102250799B1 | 2021-05-12 | |||
| KR20020033440A | 2002-05-06 | |||
| JP2005224690A | 2005-08-25 | |||
| JP5942237B1 | 2016-06-29 | |||
| JPH08318002A | 1996-12-03 |
Attorney, Agent or Firm:
YOON, Jae Seung (KR)
Download PDF:
Previous Patent: BATTERY MODULE, BATTERY PACK AND VEHICLE INCLUDING SAME
Next Patent: AI-BASED DISEASE DIAGNOSIS METHOD AND DEVICE USING VOICE DATA
Next Patent: AI-BASED DISEASE DIAGNOSIS METHOD AND DEVICE USING VOICE DATA