Title:
MOLD, METHOD FOR PRODUCING SAME, ARTICLE HAVING MICRO-RELIEF STRUCTURE ON SURFACE, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2011/132771
Kind Code:
A1
Abstract:
Disclosed is a mold—of which the surface, which is of an aluminum base material having a purity of at least 99.5 mass%, is anodized and a micro-relief structure is formed at said surface—wherein the 60-degree glossiness of the surface on the side to which the micro-relief structure has been formed is at least 750%.
Inventors:
KOJIMA Katsuhiro (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
小嶋 克宏 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
小嶋 克宏 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
Application Number:
JP2011/059918
Publication Date:
October 27, 2011
Filing Date:
April 22, 2011
Export Citation:
Assignee:
Mitsubishi Rayon Co., Ltd. (6-41, Konan 1-chome Minato-k, Tokyo 06, 〒1088506, JP)
三菱レイヨン株式会社 (〒06 東京都港区港南一丁目６番４１号 Tokyo, 〒1088506, JP)
KOJIMA Katsuhiro (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
三菱レイヨン株式会社 (〒06 東京都港区港南一丁目６番４１号 Tokyo, 〒1088506, JP)
KOJIMA Katsuhiro (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
International Classes:
C25D11/04; B29C33/38; B81B1/00; B81C1/00; C25D11/12; C25D11/24; G02B1/11
Attorney, Agent or Firm:
SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)
Claims: