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Patent Searching and Data


Title:
MOLD RELEASE FILM FOR THE RESIN ENCAPSULATION OF SEMICONDUCTORS
Document Type and Number:
WIPO Patent Application WO/2008/020543
Kind Code:
A1
Abstract:
The invention provides a mold release film for the resin encapsulation of semiconductors which exhibits low gas permeability, little suffers from the staining of a mold with an encapsulating resin, and exerts high mold release properties. The invention relates to a gas-barrier mold release film for the resin encapsulation of semiconductors which comprises a mold release layer (I) exerting excellent mold release properties and a plastic base layer (II) supporting the layer (I), wherein the base layer (II) exhibits a strength of 1 to 50MPa at 200% elongation and 170°C and the mold release film exhibits a xylene gas permeability of 5Œ10-15 (kmol m/(s m2 kPa)) or below at 170°C. It is preferable that the layer (I) be made of a fluororesin such as ethylene /tetrafluoroethylene copolymer, while the layer (II) be made of an ethylene/vinyl alcohol copolymer.

Inventors:
OKUYA TAMAO (JP)
ARUGA HIROSHI (JP)
HIGUCHI YOSHIAKI (JP)
Application Number:
PCT/JP2007/064915
Publication Date:
February 21, 2008
Filing Date:
July 30, 2007
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
OKUYA TAMAO (JP)
ARUGA HIROSHI (JP)
HIGUCHI YOSHIAKI (JP)
International Classes:
H01L21/56; B29C33/68
Foreign References:
JP2002361643A2002-12-18
JP2006049850A2006-02-16
JP2004079566A2004-03-11
Attorney, Agent or Firm:
SENMYO, Kenji et al. (SIA Kanda Square 17, Kanda-konyacho, Chiyoda-k, Tokyo 35, JP)
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