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Title:
MOLDED ARTICLE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2015/152310
Kind Code:
A1
Abstract:
　The present invention provides an imprint mold characterized in having high mold release durability, the resin base material having a graft chain containing a perfluoropolyether group or a perfluoroalkyl group, and the graft chain being present to a depth of at least 0.2 μm from the surface of the resin base material, being present to a depth of up to 200 μm at a maximum, and not exceeding a depth of 95% of the thickness of the resin base material.

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Inventors:
SATOH KAZUYUKI
OSHIMA AKIHIRO (JP)
Application Number:
PCT/JP2015/060282
Publication Date:
October 08, 2015
Filing Date:
March 31, 2015
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
UNIV OSAKA (JP)
International Classes:
C08J7/00; B29C59/02; B32B27/16; B32B27/30; C08J7/12; H01L21/027
Domestic Patent References:
WO2012018043A12012-02-09
Foreign References:
JP2014028951A2014-02-13
JP2007320072A2007-12-13
Attorney, Agent or Firm:
SAMEJIMA, Mutsumi et al. (JP)
Mutsumi Sameshima (JP)
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