Title:
MONITORING DEVICE ENABLING LARGE-SCALE MEASUREMENT
Document Type and Number:
WIPO Patent Application WO/2023/063657
Kind Code:
A1
Abstract:
Disclosed is a monitoring device enabling large-scale measurement, the device being capable of easily diagnosing the performance of equipment in a semiconductor process or a display process. The monitoring device comprises: a protective layer; a substrate arranged in the space inside the protective layer; and at least one electronic element arranged on the substrate, wherein the electronic element has at least one sensor. The monitoring device uses the sensor to measure at least one from among the temperature of an object to be diagnosed, positioned outside the monitoring device, inclination, light, vibration, voltage, current, pressure, and distance between the object to be diagnosed and another element, so as to diagnose the object to be diagnosed, an engraved structure or an embossed structure is formed on the substrate, and the engraved structure is filled with a material having a property different from that of the substrate, or the embossed structure is made of a material having a property different from that of the substrate.
Inventors:
LEE JUN YONG (KR)
KIM JAE HWAN (KR)
OH JAE WON (KR)
KIM JAE HWAN (KR)
OH JAE WON (KR)
Application Number:
PCT/KR2022/015134
Publication Date:
April 20, 2023
Filing Date:
October 07, 2022
Export Citation:
Assignee:
WIT CORPERATION (KR)
FINE SEMITECH CORP (KR)
FINE SEMITECH CORP (KR)
International Classes:
H01L21/66; H01L21/67; H01L21/683
Foreign References:
| KR20210044334A | 2021-04-23 | |||
| KR20180050472A | 2018-05-15 | |||
| KR20180084877A | 2018-07-25 | |||
| KR20150062556A | 2015-06-08 | |||
| KR20190066193A | 2019-06-13 |
Attorney, Agent or Firm:
CHOI, Kwan Lak (KR)
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