Title:
MONOLITHIC MICRO-ENGINEERED MASS SPECTROMETER
Document Type and Number:
WIPO Patent Application WO2004013890
Kind Code:
A3
Abstract:
A method of constructing a micro-engineered mass spectrometer from bonded silicon-on-insulator (BSOI) wafers is described with reference to a quadrupole spectrometer. The quadrupole geometry is achieved using two BSOI wafers (200), which are bonded together to form a monolithic block (410). Deep etched features and springs formed in the outer silicon layers are used to locate cylindrical metallic electrode rods (300). The precision of the assembly is determined by a combination of lithography and deep etching, and by the mechanical definition of the bonded silicon layers. Deep etched features formed in the inner silicon layers are used to define ion entrance and ion collection optics. Other features such as fluidic channels may be incorporated.
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Inventors:
SYMS RICHARD (GB)
Application Number:
PCT/EP2003/008354
Publication Date:
April 15, 2004
Filing Date:
July 29, 2003
Export Citation:
Assignee:
MICROSAIC SYSTEMS LTD (GB)
SYMS RICHARD (GB)
SYMS RICHARD (GB)
International Classes:
H01J49/42; (IPC1-7): H01J49/04
Foreign References:
| US6025591A | 2000-02-15 | |||
| US5386115A | 1995-01-31 |
Other References:
TULLSTALL J J ET AL: "Silicon micromachined mass filter for a low power, low cost quadrupole mass spectrometer", 25 January 1998, MICRO ELECTRO MECHANICAL SYSTEMS, 1998. MEMS 98. PROCEEDINGS., THE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP ON HEIDELBERG, GERMANY 25-29 JAN. 1998, NEW YORK, NY, USA,IEEE, US, PAGE(S) 438-442, ISBN: 0-7803-4412-X, XP010270256
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