Title:
MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2014/104496
Kind Code:
A1
Abstract:
The present invention relates to a monomer for a hardmask composition which is expressed in chemical formula 1, the hardmask composition including the monomer, and a method for forming a pattern by using the hardmask composition. In chemical formula 1, the definitions of A1-A3, X1-X3, L1, L2, n, and m are the same as stated in the specification.
Inventors:
KIM YUN-JUN (KR)
KWON HYO-YOUNG (KR)
KIM HEA-JUNG (KR)
LEE CHUNG-HEON (KR)
CHO YOUN-JIN (KR)
CHOI YOO-JEONG (KR)
KWON HYO-YOUNG (KR)
KIM HEA-JUNG (KR)
LEE CHUNG-HEON (KR)
CHO YOUN-JIN (KR)
CHOI YOO-JEONG (KR)
Application Number:
PCT/KR2013/004903
Publication Date:
July 03, 2014
Filing Date:
June 04, 2013
Export Citation:
Assignee:
CHEIL IND INC (KR)
International Classes:
C07C39/12; C07C39/04; G03F7/004
Foreign References:
| KR20120067602A | 2012-06-26 | |||
| KR20100080139A | 2010-07-08 | |||
| KR20090120827A | 2009-11-25 | |||
| KR100833212B1 | 2008-05-28 | |||
| KR20070024512A | 2007-03-02 |
Attorney, Agent or Firm:
PANKOREA PATENT AND LAW FIRM (KR)
팬코리아특허법인 (KR)
팬코리아특허법인 (KR)
Download PDF:
Previous Patent: MULTILAYER THIN FILM FOR CUTTING TOOL AND CUTTING TOOL COMPRISING SAME
Next Patent: CONNECTOR FOR WIRELESS COMMUNICATION EQUIPMENT
Next Patent: CONNECTOR FOR WIRELESS COMMUNICATION EQUIPMENT