MPCVD CONTROL SYSTEM

WIPO Patent Application WO/2023/102776

A1

The present invention relates to the technical field of system software, and in particular relate to an MPCVD control system. The control system comprises a main control system and a plurality of slave systems, wherein the main control system is in communication connection with the slave systems. The main control system is mainly used for issuing working node parameters to the slave systems, and collecting working states of the slave systems. The slave systems each further comprise a gas flow proportion subsystem, a vacuum and pressure control subsystem, a temperature and flow control subsystem and a power source control system. The gas flow proportion subsystem is used for collecting and proportioning paths of gas flow, the vacuum and pressure control subsystem is used for adjusting a vacuum state in a cavity, the temperature and flow control subsystem is used for adjusting a water temperature and a water flow in the cavity, and the power source control system is used for adjusting parameters such as a working voltage, a working current and an output power of the control system. By means of the present solution, parameters can be adjusted at the same time, so as to ensure the quality of a finally obtained diamond thin film.

HE LEI (CN)
LI JUNHONG (CN)
WEI MINGMIAN (CN)
ZOU GUANGTIAN (CN)
LV XIANYI (CN)
WANG QILIANG (CN)

PCT/CN2021/136494

June 15, 2023

December 08, 2021

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CHENGDU NEWMAN HERUI MICROWAVE TECH CO LTD (CN)
SHENZHEN RESEARCH INSTITUTE OF JILIN UNIV (CN)

C23C16/511; C23C16/513; C23C16/517; C23C16/52; H01J37/32

CN108546933A	2018-09-18
CN214572219U	2021-11-02
CN214099578U	2021-08-31
CN103199035A	2013-07-10
US20040069232A1	2004-04-15

BEIJING ZHUOHENG INTELLECTUAL PROPERTY AGENCY (SPECIAL GENERAL PARTNERSHIP) (CN)

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