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Patent Searching and Data


Title:
MULTI-BLOCK COPOLYMER
Document Type and Number:
WIPO Patent Application WO/2014/178674
Kind Code:
A1
Abstract:
The present invention relates to a multi-block copolymer, an adhesive composition, a method for preparing the multi-block copolymer, an adhesive type polarizing plate, and a liquid crystal display, and the adhesive composition comprising the multi-block copolymer according to the present invention can exhibit excellent durability regardless of temperature and/or humidity. In addition, according to the method for preparing a multi-block copolymer, a multi-block copolymer which is structurally controlled and has an increased molecular weight can be prepared through a simple process using a compound containing at least two halogen atoms. Thus, the multi-block copolymer, when being contained in an adhesive resin, can have enhanced cohesive force in the resin and form a network structure at the time of hardening, leading to excellent durability regardless of temperature and humidity when applied to the adhesive composition, and thus can be usefully applied to an optical member.

Inventors:
KIM, Su Jeong (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
YOON, Jeong Ae (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
LEE, Min Ki (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
CHI, Han Na (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
KIM, No Ma (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
YOON, Sung Soo (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon 305-738, 305-738, KR)
Application Number:
KR2014/003906
Publication Date:
November 06, 2014
Filing Date:
May 01, 2014
Export Citation:
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Assignee:
LG CHEM, LTD. (128, Yeoui-daero,Yeongdeungpo-gu, Seoul 150-721, 150-721, KR)
International Classes:
C08F297/06; C08F297/08; C08L53/00; C09J153/00
Foreign References:
KR20110002857A2011-01-10
JP2006282687A2006-10-19
KR20050076706A2005-07-26
JP2007527463A2007-09-27
KR20100011179A2010-02-03
KR20090072861A2009-07-02
Other References:
KWIATKOWSKI, PIOTR ET AL.: "High molecular weight polymethacrylates by AGET ATRP under high pressure.", MACROMOLECULES., vol. 41, no. 4, 2008, pages 1067 - 1069, XP055294107
See also references of EP 2993194A4
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (5th Floor, New Wing Gwangsung Bldg.,,11, Yeoksam-ro 3-gil,,Gangnam-gu, Seoul 135-936, 135-936, KR)
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