Title:
MULTI-COLUMN ELECTRON BEAM LITHOGRAPHY INCLUDING FIELD EMITTERS ON A SILICON SUBSTRATE WITH BORON LAYER
Document Type and Number:
WIPO Patent Application WO/2018/071710
Kind Code:
A3
Abstract:
A multi-column electron beam device includes an electron source comprising multiple field emitters fabricated on a surface of a silicon substrate. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitters. The field emitters can take various shapes including a pyramid, a cone, or a rounded whisker. Optional gate layers may be placed on the output surface near the field emitters. The field emitter may be p-type or n-type doped. Circuits may be incorporated into the wafer to control the emission current. A light source may be configured to illuminate the electron source and control the emission current. The multi-column electron beam device may be a multi-column electron beam lithography system configured to write a pattern on a sample.
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Inventors:
CHUANG YUNG-HO ALEX (US)
FIELDEN JOHN (US)
LIU XUEFENG (US)
XIAOLI YINYING (US)
FIELDEN JOHN (US)
LIU XUEFENG (US)
XIAOLI YINYING (US)
Application Number:
PCT/US2017/056400
Publication Date:
July 26, 2018
Filing Date:
October 12, 2017
Export Citation:
Assignee:
KLA TENCOR CORP (US)
International Classes:
H01J37/317; H01J1/304; H01J37/073
Foreign References:
| US20110204224A1 | 2011-08-25 | |||
| JP2005310724A | 2005-11-04 | |||
| US20100258724A1 | 2010-10-14 | |||
| US20140246397A1 | 2014-09-04 | |||
| US20090315444A1 | 2009-12-24 |
Attorney, Agent or Firm:
MCANDREWS, Kevin et al. (US)
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