MULTI-STEP PROCESS FOR ETCHING PHOTOMASKS

Title:

MULTI-STEP PROCESS FOR ETCHING PHOTOMASKS

Document Type and Number:

WIPO Patent Application WO2004086143

Kind Code:

A3

Abstract:

Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle on a support member in a processing chamber, wherein the reticle comprises a metal photomask layer formed on a silicon-based substrate, and a patterned resist material deposited on the silicon-based substrate, etching the substrate with an oxygen-free processing gas, and then etching the substrate with an oxygen containing processing gas.

Inventors:

BROOKS CYNTHIA B (US)
BUIE MELISA J (US)
STOEHR BRIGITTE C (US)

Application Number:

PCT/US2004/008335

Publication Date:

April 14, 2005

Filing Date:

March 18, 2004

Export Citation:

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Assignee:

APPLIED MATERIALS INC (US)
BROOKS CYNTHIA B (US)
BUIE MELISA J (US)
STOEHR BRIGITTE C (US)

International Classes:

A61N5/00; B44C1/22; C03C15/00; C03C25/68; C23F1/00; C23F4/00; G03C5/00; G03F1/00; G03F1/80; G03F9/00; G21G5/00; (IPC1-7): G03F1/08; G03F1/14; G03F1/08

Foreign References:

EP0054736A2	1982-06-30
US6472107B1	2002-10-29

Other References:

MOHRI H ET AL: "Manufacturing of half-tone phase shift masks: I. Blank", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 2254, 1994, pages 238 - 247, XP002313337, ISSN: 0277-786X
MIYASHITA H ET AL: "Manufacturing of half-tone phase shift masks: II. Writing and process", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 2254, 1994, pages 248 - 260, XP002313338, ISSN: 0277-786X

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