Title:
MULTILAYER FILM AND PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2017/150166
Kind Code:
A1
Abstract:
A multilayer film provided with a first resin layer comprising a resin [I], and with a second resin layer comprising a resin [II] and disposed on at least one surface of the first resin layer; wherein the resin [I] contains an alkoxysilyl-modified substance [3] of a block copolymer hydride and an ester compound [4]; the alkoxysilyl-modified substance [3] is an alkoxysilyl group-modified substance of a hydride [2] for which 90% or more of the carbon-carbon unsaturated bonds of the main chain and side chains of a block copolymer [1] and of the carbon-carbon unsaturated bonds of the aromatic ring have been hydrogenated; and the percentage of the ester compound [4] in the resin [I] is from 0.1 weight% to 10 weight%.
Inventors:
MIURA TAKUYA (JP)
Application Number:
PCT/JP2017/005196
Publication Date:
September 08, 2017
Filing Date:
February 13, 2017
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
B32B27/30; B29C48/08; B29C48/18; B29C48/21; B32B27/00; C08F8/42; B29K83/00; B29L7/00; B29L9/00
Domestic Patent References:
| WO2012043708A1 | 2012-04-05 |
Foreign References:
| JP2013132755A | 2013-07-08 | |||
| JP2011013378A | 2011-01-20 | |||
| JP2010234547A | 2010-10-21 | |||
| JP2006051632A | 2006-02-23 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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