Title:
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/054145
Kind Code:
A1
Abstract:
Provided is a multilayer reflective film-equipped substrate having a multilayer reflective film which has a shallow effective reflection surface and in which it is possible to suppress the phenomenon in which atoms serving as a material are diffused between a low-refractive-index layer and a high-refractive-index layer. This multilayer reflective film-equipped substrate has a substrate (1) and a multilayer reflective film (2) provided on the substrate and is characterized in that: the multilayer reflective film includes a multilayer film in which a low-refractive-index layer (24) and a high-refractive-index layer (22) including silicon (Si) are alternatingly layered; the multilayer reflective film further includes at least one intermediate layer (26) disposed between the low-refractive-index layer and the high-refractive-index layer; the multilayer reflective film includes at least one added element selected from nitrogen (N), carbon (C), and oxygen (O); and the content of the added element in the multilayer reflective film is no more than 40 at%.
Inventors:
UMEZAWA TEIICHIRO (JP)
IKEBE YOHEI (JP)
IKEBE YOHEI (JP)
Application Number:
PCT/JP2022/035292
Publication Date:
April 06, 2023
Filing Date:
September 22, 2022
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F7/20; G03F1/24; G21K1/06
Foreign References:
| JP2006332153A | 2006-12-07 | |||
| JP2016111035A | 2016-06-20 | |||
| JP2022045936A | 2022-03-23 |
Other References:
WOOD OBERT; WONG KEITH; PARKS VALENTIN; KEARNEY PATRICK; MEYER-ILSE JULIA; LUONG VU; PHILIPSEN VICKY; FAHEEM MOHAMMAD; LIANG YIFAN: "Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks", PROCEEDINGS OF SPIE, vol. 9776, 18 March 2016 (2016-03-18), US , pages 977619-1 - 977619-10, XP060067570, ISBN: 978-1-5106-1533-5, DOI: 10.1117/12.2219215
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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