MULTILAYER STRUCTURE - UBE INDUSTRIES

Title:

MULTILAYER STRUCTURE

Document Type and Number:

WIPO Patent Application WO/2005/102694

Kind Code:

A1

Abstract:

Disclosed is a multilayer structure which is composed of two or more layers including at least a layer (a) composed of an aliphatic polyamide (A) and a layer (b) composed of a semi-aromatic polyamide (B) comprising diamine units containing not less than 60 mol% of aliphatic diamine units having 9-13 carbon atoms relative to the total diamine units and dicarboxylic acid units containing not less than 50 mol% of terephthalic acid units and/or naphthalene dicarboxylic acid units relative to the total dicarboxylic acid units. The layer (b) is arranged as the innermost layer. This multilayer structure is excellent in heat resistance, chemical resistance, chemical and/or gas permeation barrier properties, dissolution resistance of monomers/oligomers, interlayer adhesion and durability.

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Inventors:

NISHIOKA TOMOHARU (JP)
KUBO TSUYOSHI (JP)
YAMASHITA TAKASHI (JP)
UCHIDA KOICHI (JP)

Application Number:

PCT/JP2005/008380

Publication Date:

November 03, 2005

Filing Date:

April 26, 2005

Export Citation:

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Assignee:

UBE INDUSTRIES (JP)
KURARAY CO (JP)
NISHIOKA TOMOHARU (JP)
KUBO TSUYOSHI (JP)
YAMASHITA TAKASHI (JP)
UCHIDA KOICHI (JP)

International Classes:

B32B1/08; B32B27/34; B65D1/09; F16L11/04; F16L11/06; (IPC1-7): B32B27/34; B32B1/08; B65D1/09; F16L11/04

Foreign References:

JP2005119017A	2005-05-12
JP2005178076A	2005-07-07
JP2004244579A	2004-09-02
JP2003247672A	2003-09-05
JPH037761A	1991-01-14

Other References: