Title:
MULTILAYER STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2023/176784
Kind Code:
A1
Abstract:
The following is provided as a multilayer structure that has excellent transparency and impact resistance and is easy to recycle. A multilayer structure that has a polar group-containing resin layer (A) comprising a polar group-containing resin (a) that comprises an ethylene-vinyl alcohol copolymer and/or polyamide, a polyolefin resin layer (B) comprising a polyolefin resin (b1) and a compatibilizer (b2), and an adhesive resin layer (C), wherein the melt flow rate of the compatibilizer (b2) is 600 g/10 min (190℃, load 2160 g) or less, and the content of the compatibilizer (b2) is 10-200 parts by mass with respect to 100 parts by mass of the polar group-containing resin (a).
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Inventors:
TERAOKA KOTA (JP)
Application Number:
PCT/JP2023/009660
Publication Date:
September 21, 2023
Filing Date:
March 13, 2023
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
B32B27/32; C08L23/02; C08L23/08; C08L23/26
Foreign References:
| JPH07292172A | 1995-11-07 | |||
| JP2000512574A | 2000-09-26 | |||
| JP2018039134A | 2018-03-15 |
Attorney, Agent or Firm:
SAITOH Yukihiko et al. (JP)
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