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Title:
MULTILEVELED SUBSTRATE COATING FILM FORMING COMPOSITION CONTAINING PLASMA-CURABLE COMPOUND BASED ON UNSATURATED BONDS BETWEEN CARBON ATOMS
Document Type and Number:
WIPO Patent Application WO/2018/190380
Kind Code:
A1
Abstract:
[Problem] To provide a plasma-curable multileveled substrate coating film forming composition for forming a coating having pattern-filling properties and planarization properties. [Solution] A plasma-curable multileveled substrate coating film forming composition containing a compound (E) which contains at least one partial structure selected from partial structures (I) represented by formulas (1-1) through (1-7), and a solvent (F). (In the formula, R1, R1a, R3, R5a, and R6a each independently represent an alkylene group comprising 1–10 carbon atoms, an arylene group comprising 6–40 carbon atoms (said alkylene group or arylene group may be optionally substituted with one or more amide groups or amino groups), an oxygen atom, a carbonyl group, a sulfur atom, -C(O)-NRa-, -NRb-, or a divalent group comprising a combination thereof; each R5 independently represents a nitrogen atom, or a trivalent group comprising a combination of a nitrogen atom and at least one radical selected from the group consisting of alkylene groups comprising 1–10 carbon atoms, arylene groups comprising 6–40 carbon atoms (said alkylene groups and arylene groups may be optionally substituted with one or more amide groups or amino groups), oxygen atoms, carbonyl groups, sulfur atoms, -C(O)-NRa-, and -NRb-; R2, R2a, R4, and R6 each independently represent a hydrogen atom, an alkyl group comprising 1–10 carbon atoms, or a monovalent group comprising a combination of a hydrogen atom and at least one radical selected from the group consisting of alkylene groups comprising 1–10 carbon atoms, oxygen atoms, carbonyl groups, -C(O)-NRa-, and -NRb-; Ra represents a hydrogen atom or an alkyl group comprising 1–10 carbon atoms; Rb represents a hydrogen atom, an alkyl group comprising 1–10 carbon atoms, or an alkyl carbonyl group comprising 1–10 carbon atoms; n represents a repeating unit number of 1–10; and the dotted lines represent chemical bonds with adjacent atoms).

Inventors:
ENDO TAKAFUMI (JP)
TOKUNAGA HIKARU (JP)
HASHIMOTO KEISUKE (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2018/015268
Publication Date:
October 18, 2018
Filing Date:
April 11, 2018
Export Citation:
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Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; G03F7/26; H01L21/027
Domestic Patent References:
WO2010061774A12010-06-03
WO2013022099A12013-02-14
Foreign References:
JP2007078890A2007-03-29
JP2012186373A2012-09-27
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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