MULTINARY DEPOSITION FILM PRODUCTION STABILIZING DEVICE AND METHOD, AND TOOL WITH MULTINARY DEPOSITION FILM

WIPO Patent Application WO/2005/001154

A1

A production stabilizing device and method for forming a multinary deposition film having a good quality and containing metal components such as TiAlN having greatly different melting points with a high material use efficiency by means of a single crucible (3) and a converged plasma (7). Electric power necessary to evaporate a material (4) is first supplied, and then the supplied electric power is increased in steps up to the necessary maximum electric power repeatedly. Alternatively, plasma control is conducted to converge a plasma (7) in a first region necessary to evaporate the material and plasma control is conducted to continuously and sequentially move and expand the plasma from the first plasma region to the maximum plasma region so as to sequentially melt the unmelted portion (4b) of the material. The material is a sintered body or a green compact formed body (4).

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Sato, Hideki (11-17, Higashiishiganemachi Toyama-shi, Toyama 64, 93009, JP)
Sonobe, Masaru (283-5, Takehana Funahashimur, Nakaniikawa-gun Toyama 84, 93002, JP)
Kato, Norihiro (2-9-12, Inujimashinmachi Toyama-shi, Toyama 28, 93183, JP)
Yasuoka, Manabu (146 Nunoichishinmachi, Toyama-shi Toyama 92, -, 93981, JP)

PCT/JP2004/009158

January 06, 2005

June 29, 2004

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NACHI-FUJIKOSHI CORP. (1-1 Fujikoshi-Honmachi 1-chome, Toyama-shi, Toyama 11, 93085, JP)
Sato, Hideki (11-17, Higashiishiganemachi Toyama-shi, Toyama 64, 93009, JP)
Sonobe, Masaru (283-5, Takehana Funahashimur, Nakaniikawa-gun Toyama 84, 93002, JP)
Kato, Norihiro (2-9-12, Inujimashinmachi Toyama-shi, Toyama 28, 93183, JP)
Yasuoka, Manabu (146 Nunoichishinmachi, Toyama-shi Toyama 92, -, 93981, JP)

B23B27/14; B23B51/00; B23P15/28; C23C14/06; C23C14/32; (IPC1-7): C23C14/32; B23B27/14; B23B51/00; B23P15/28

Asamura, Kiyoshi (Room 331, New Ohtemachi Bldg. 2-1, Ohtemachi 2-chom, Chiyoda-ku Tokyo 04, 10000, JP)

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