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Title:
NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2018/043680
Kind Code:
A1
Abstract:
Provided is a sputtering target which enables decrease in the heat treatment temperature for ordering an Fe-Pt magnetic phase, and which is suppressed in generation of particles during the sputtering. A non-magnetic material-dispersed sputtering target which contains Fe, Pt and Ge, and which has a magnetic phase satisfying a composition represented by (Fe1-αPtα)1-βGeβ (wherein α and β represent numbers satisfying 0.35 ≤ α ≤ 0.55 and 0.05 ≤ β ≤ 0.2) with respect to Fe, Pt and Ge in terms of an atomic ratio, and wherein the magnetic phase is configured such that the ratio of the average area ratio (SGe30mass%) of a Ge-based alloy phase having a Ge concentration of 30% by mass or more to the area ratio (SGe) of Ge as calculated from the overall composition of the sputtering target, namely SGe30mass%/SGe is 0.5 or less in the element mapping of a polished surface by means of EPMA if a cross-section perpendicular to the sputtering surface of the sputtering target is polished.

Inventors:
SATO,Atsushi (JX Nippon Mining & Metals Corporation187-4,Usuba,Hanakawa-cho,Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
TAKAMI,Hideo (JX Nippon Mining & Metals Corporation187-4,Usuba,Hanakawa-cho,Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
NAKAMURA,Yuichiro (JX Nippon Mining & Metals Corporation187-4,Usuba,Hanakawa-cho,Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
Application Number:
JP2017/031469
Publication Date:
March 08, 2018
Filing Date:
August 31, 2017
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORPORATION (1-2Otemachi 1-chome, Chiyoda-ku Tokyo, 64, 〒1008164, JP)
International Classes:
C23C14/34; B22F1/00; C22C5/04; C22C28/00; C22C38/00; G11B5/64; G11B5/851; B22F3/14; B22F3/15
Domestic Patent References:
WO2014196377A12014-12-11
WO2014188916A12014-11-27
WO2014185266A12014-11-20
WO2014064995A12014-05-01
WO2014087665A12014-06-12
Foreign References:
JP2015175025A2015-10-05
JP2016166404A2016-09-15
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (Shimbashi i-mark Bldg, 6-2 Shimbashi 2-Chome Minato-k, Tokyo 04, 〒1050004, JP)
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