Title:
NOx PURGING SYSTEM AND METHOD OF REACTIVATING DETERIORATED CATALYST THEREIN
Document Type and Number:
WIPO Patent Application WO/2003/083273
Kind Code:
A1
Abstract:
A NOx purging system using a direct reduction type NOx catalyst, wherein sulfur is purged while avoiding the occurrence of secondary sulfur poisoning, taking advantage of capability of recovery from deterioration caused by sulfur poisoning at exhaust gas temperature exhibited at normal operating zone, so that the influence of sulfur poisoning can be eliminated and NOx is efficiently purged; and a method of reactivating deteriorated catalyst therein. In particular, a NOx purging system (10) comprising exhaust gas passage (2) and, arranged therein, direct reduction type NOx catalyst (3), which NOx purging system (10) is fitted with first sulfur purge control means (222) for performing such first sulfur purge operation that when exhaust temperature (Tg) becomes higher than given set temperature (T1) during normal operation, not only is the oxygen concentration of exhaust gas decreased but also the exhaust temperature (Tg) is raised to not below sulfur purge temperature (Tr).
Inventors:
NAKATSUJI TADAO (FI)
YOKOYAMA JIN (JP)
NAKATA TERUO (JP)
UEKUSA TAIJI (JP)
UEMATSU YUTAKA (JP)
FUJITA TETSUYA (JP)
TANAKA YOSUKE (JP)
ENOKI KAZUHIRO (JP)
SHIBUYA HIROMI (JP)
YOKOYAMA JIN (JP)
NAKATA TERUO (JP)
UEKUSA TAIJI (JP)
UEMATSU YUTAKA (JP)
FUJITA TETSUYA (JP)
TANAKA YOSUKE (JP)
ENOKI KAZUHIRO (JP)
SHIBUYA HIROMI (JP)
Application Number:
PCT/JP2003/003937
Publication Date:
October 09, 2003
Filing Date:
March 28, 2003
Export Citation:
Assignee:
ISUZU MOTORS LTD (JP)
VALTION TEKNILLINEN (FI)
NAKATSUJI TADAO (FI)
YOKOYAMA JIN (JP)
NAKATA TERUO (JP)
UEKUSA TAIJI (JP)
UEMATSU YUTAKA (JP)
FUJITA TETSUYA (JP)
TANAKA YOSUKE (JP)
ENOKI KAZUHIRO (JP)
SHIBUYA HIROMI (JP)
VALTION TEKNILLINEN (FI)
NAKATSUJI TADAO (FI)
YOKOYAMA JIN (JP)
NAKATA TERUO (JP)
UEKUSA TAIJI (JP)
UEMATSU YUTAKA (JP)
FUJITA TETSUYA (JP)
TANAKA YOSUKE (JP)
ENOKI KAZUHIRO (JP)
SHIBUYA HIROMI (JP)
International Classes:
F02D45/00; B01D53/86; B01D53/94; F01N3/08; F01N3/20; F01N3/24; F01N9/00; F01N11/00; F02D41/04; (IPC1-7): F01N3/20
Domestic Patent References:
WO2002022255A1 | 2002-03-21 |
Foreign References:
EP1065351A1 | 2001-01-03 | |||
JP2000192813A | 2000-07-11 | |||
JP2000179328A | 2000-06-27 | |||
JPH11294147A | 1999-10-26 | |||
JPH0893456A | 1996-04-09 | |||
JP2000274279A | 2000-10-03 |
Other References:
See also references of EP 1491736A4
Attorney, Agent or Firm:
Ogawa, Shin-ichi (Noguchi & Saika International Patent
Office Toranomon 11 Mori Building, 6-4,
Toranomon 2-chom, Minato-ku Tokyo, JP)
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