Title:
NAIL POLISH REMOVAL SYSTEM
Document Type and Number:
WIPO Patent Application WO2003000085
Kind Code:
A3
Abstract:
A nail polish removal system (310) broadly comprises a hollow applicator handle (316) having an applicator end (318) with an absorbent material (320) attached thereto. The handle (316) has an opening (326) at the applicator end (318). The handle (316) contains a breakable capsule (328). Adjacent to the breakable capsule (328) and opposite to the opening (326), the handle (316) has a seal (330). The breakable capsule (328) is filled with up to one ounce of the nail polish removal solution. The breakable capsule (328) is broken releasing the nail polish removal solution. The released nail polish removal solution saturates the absorbent material (320) by flowing through the opening (326). The nail polish removal solution is prevented from escaping the handle (316), other than through the opening (326), by the seal (330). The nail polish removal system (310) is used and discarded.
Inventors:
DOCKERY NETRISA T P (US)
Application Number:
PCT/US2002/013615
Publication Date:
February 27, 2003
Filing Date:
April 30, 2002
Export Citation:
Assignee:
DOCKERY NETRISA T P (US)
International Classes:
A45D29/00; A45D34/04; (IPC1-7): A45D29/18
Foreign References:
| US2841809A | 1958-07-08 | |||
| US5112152A | 1992-05-12 | |||
| US4173978A | 1979-11-13 |
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