Title:
NANO PATTERN WRITER
Document Type and Number:
WIPO Patent Application WO/2011/025287
Kind Code:
A1
Abstract:
A method for manufacturing a nano pattern writer includes forming one or more grooves on a first layer, depositing a substance on the first layer to form a film on the first layer, polishing the film on the first layer to thereby form a patterned film that fills the one or more grooves on the first layer, placing a second layer over the patterned film to thereby form a layered structure interposing the patterned film between the first layer and the second layer, and removing a part of the first layer and the second layer to thereby expose portions of the patterned film.
Inventors:
LEE KWANGYEOL (KR)
Application Number:
PCT/KR2010/005757
Publication Date:
March 03, 2011
Filing Date:
August 27, 2010
Export Citation:
Assignee:
UNIV KOREA RES & BUS FOUND (KR)
International Classes:
B82B3/00
Foreign References:
| US20070020773A1 | 2007-01-25 | |||
| US20050094327A1 | 2005-05-05 | |||
| US7335594B1 | 2008-02-26 | |||
| US6757116B1 | 2004-06-29 | |||
| US20070175860A1 | 2007-08-02 |
Attorney, Agent or Firm:
HONG, Won-Jin (Kukdong Building 60-1,Chungmuro3-ka, Chung-ku, Seoul 100-705, KR)
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