Title:
NANOFABRICATION
Document Type and Number:
WIPO Patent Application WO2002073699
Kind Code:
A9
Abstract:
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
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Inventors:
TUOMINEN MARK (US)
RUSSELL THOMAS P (US)
URSACHE ANDREI (US)
BAL MUSTAFA (US)
RUSSELL THOMAS P (US)
URSACHE ANDREI (US)
BAL MUSTAFA (US)
Application Number:
PCT/US2002/007769
Publication Date:
May 06, 2004
Filing Date:
March 14, 2002
Export Citation:
Assignee:
UNIV MASSACHUSETTS (US)
TUOMINEN MARK T (US)
RUSSELL THOMAS P (US)
URSACHE ANDREI (US)
BAL MUSTAFA (US)
TUOMINEN MARK T (US)
RUSSELL THOMAS P (US)
URSACHE ANDREI (US)
BAL MUSTAFA (US)
International Classes:
G03F7/16; H01J1/304; B82B1/00; H01J9/02; H01J31/12; H01L21/8246; H01L23/48; H01L27/105; H01L29/06; H01L35/28; H01L35/32; H01L43/08; (IPC1-7): H01L29/15; H01L35/00
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