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Patent Searching and Data


Title:
NATURAL GAS TREATMENT DEVICE AND NATURAL GAS TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2020/021633
Kind Code:
A1
Abstract:
[Problem] To provide a technique for achieving the removal of impurities contained in natural gas stably even when the supply amount of the natural gas is decreased. [Solution] In a natural gas treatment device, an impurity removal treatment is carried out prior to the liquefaction of natural gas, and then a hydrocarbon separation step 25 is carried out, so that a portion of methane obtained after the separation can be recycled on an inlet port side of an impurity removal facility group 20. As a result, even when the production amount of natural gas in a wellhead is decreased and the supply amount of the natural gas is decreased, the amount of a gas to be supplied to the impurity removal facility group 20 can be increased. Consequently, the reduction in efficiency of the treatment in the impurity removal facility group 20 with the decrease in the amount of a gas to be treated in the impurity removal facility group 20 can be prevented.

Inventors:
NAKAYAMA TORU (JP)
Application Number:
PCT/JP2018/027710
Publication Date:
January 30, 2020
Filing Date:
July 24, 2018
Export Citation:
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Assignee:
JGC CORP (JP)
International Classes:
C10L3/10; B01D53/04; B01D53/14; F25J3/02
Domestic Patent References:
WO2015155818A12015-10-15
Foreign References:
JP2939814B21999-08-25
JP5041650B22012-10-03
JP4230956B22009-02-25
Attorney, Agent or Firm:
YAYOY PATENT OFFICE (JP)
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