Title:
NATURATRON SPUTTERING DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/148488
Kind Code:
A1
Abstract:
Provided is a naturatron sputtering device coping with various needs and having a high versatility. The naturatron sputtering device includes a sputtering portion in a vacuum container, in which a pair of targets are spaced apart and disposed facing each other and magnets for forming a magnetic field space between the targets are disposed behind each of the targets, the magnetic field space having a magnetic field distribution having a high magnetic flux density in the peripheral region and a low magnetic flux density in the central region. The naturatron sputtering device also has a substrate disposed on a side between the targets so as to face the magnetic field space. In the naturatron sputtering device, the magnets consist of a main magnet and a supplementary magnet, which cooperate with each other to relatively change the magnetic flux density in the central region with respect to the magnetic flux density in the peripheral region.
Inventors:
HIRATA TOYOAKI (JP)
Application Number:
PCT/JP2010/059007
Publication Date:
December 01, 2011
Filing Date:
May 27, 2010
Export Citation:
Assignee:
NATURA TECHNOLOGY INC (JP)
HIRATA TOYOAKI (JP)
HIRATA TOYOAKI (JP)
International Classes:
C23C14/35
Foreign References:
| JP2009191340A | 2009-08-27 | |||
| JP2008127582A | 2008-06-05 | |||
| JP2008115446A | 2008-05-22 | |||
| JP2008184625A | 2008-08-14 | |||
| JP2010013724A | 2010-01-21 | |||
| JP2005226091A | 2005-08-25 |
Attorney, Agent or Firm:
FUJIMOTO, NOBORU (JP)
Noboru Fujimoto (JP)
Noboru Fujimoto (JP)
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Claims: