Title:
NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX
Document Type and Number:
WIPO Patent Application WO/2022/145795
Kind Code:
A1
Abstract:
The present invention relates to a negative photo-sensitive resin composition with low-temperature curability and a low refractive index and, more specifically, to a negative photo-sensitive resin composition comprising: an acrylic copolymer comprising a repeating unit derived from a first unsaturated compound containing a heat-curable functional group and a repeating unit derived from a second unsaturated compound containing fluorine, along with a photo-initiator and a solvent, so that the resin composition is curable at 150℃ or lower and has a refractive index of 1.50 or less.
Inventors:
JEONG JONG HO (KR)
YOUN HYOC MIN (KR)
KIM JIN SUN (KR)
JEON SEUNG HAN (KR)
KIM EUI SOON (KR)
RYU YOUNG JUN (KR)
AHN CHANG HWAN (KR)
YOUN HYOC MIN (KR)
KIM JIN SUN (KR)
JEON SEUNG HAN (KR)
KIM EUI SOON (KR)
RYU YOUNG JUN (KR)
AHN CHANG HWAN (KR)
Application Number:
PCT/KR2021/018681
Publication Date:
July 07, 2022
Filing Date:
December 09, 2021
Export Citation:
Assignee:
DONGJIN SEMICHEM CO LTD (KR)
International Classes:
G03F7/038; C08F220/22; C08F222/18; G03F7/028
Foreign References:
| KR20180077743A | 2018-07-09 | |||
| KR20140003343A | 2014-01-09 | |||
| KR20180063060A | 2018-06-11 | |||
| KR20190087172A | 2019-07-24 | |||
| JP2016040577A | 2016-03-24 |
Attorney, Agent or Firm:
IPCJ PATENT & LAW FIRM (KR)
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