NEGATIVE PHOTORESISTS FOR SHORT WAVELENGTH IMAGING

Title:

NEGATIVE PHOTORESISTS FOR SHORT WAVELENGTH IMAGING

Document Type and Number:

WIPO Patent Application WO2003077029

Kind Code:

A9

Abstract:

New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions through crosslinking or other solubility switching mechanism. Preferred resists of the invention include a resin component that contains repeat units that facilitate aqueous base solubility.

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Inventors:

BARCLAY GEORGE G
PUGLIANO NICHOLAS

Application Number:

PCT/US2003/006532

Publication Date:

December 24, 2003

Filing Date:

March 04, 2003

Export Citation:

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Assignee:

SHIPLEY CO LLC (US)

International Classes:

G03F7/033; G03F7/004; G03F7/038; G03F7/075; G03F7/11; G03F7/38; H01L21/027; (IPC1-7): G03C5/00; G03F7/004

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