Title:
NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2005/101126
Kind Code:
A1
Abstract:
Disclosed is a negative photosensitive composition which is characterized by comprising an alkali-soluble resin (a), a compound (b) which can be crosslinked by an acid, a compound (c) which generates an acid when heated, a photothermal converter (d), and a resin (e) having phenolic hydroxy groups wherein a hydrogen atom in at least a part of the phenolic hydroxy groups is substituted by a substituent (X) having a group represented by the following general formula (1). (1) (In the formula, Ar represents a substituted or unsubstituted phenylene group or naphthylene group; and Y1 and Y2 independently represent COR1 or COOR2 wherein R1 and R2 independently represent an alkyl group, an aryl group or a hydrogen atom.)
Inventors:
HAYASHI KOJI (JP)
TORIHATA YUUKI (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
TORIHATA YUUKI (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
Application Number:
PCT/JP2005/007172
Publication Date:
October 27, 2005
Filing Date:
April 13, 2005
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS JP (JP)
HAYASHI KOJI (JP)
TORIHATA YUUKI (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
HAYASHI KOJI (JP)
TORIHATA YUUKI (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
International Classes:
B41C1/10; B41M5/36; G03F7/00; G03F7/004; G03F7/038; (IPC1-7): G03F7/038; G03F7/00; G03F7/004
Foreign References:
| JP2002341536A | 2002-11-27 | |||
| JPH1055066A | 1998-02-24 | |||
| JPH1016423A | 1998-01-20 |
Attorney, Agent or Firm:
Aoki, Atsushi (Ishida & Associates Toranomon 37 Mori
Bldg., 5-1, Toranomon 3-chom, Minato-ku Tokyo 23, JP)
Download PDF: