NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM AND METHOD OF FORMATION OF SAME

WIPO Patent Application WO/2011/105443

A1

Disclosed is a negative photosensitive resin composition comprised of (A) an annual olefin resin containing repeating units represented by a general formula (1) (where R1, R2, R3 and R4 each represent an independent substituent group chosen from: a hydrogen atom, an alkyl group having 1-15 carbon atoms, an alkenyl group with 2-20 carbon atoms, a cycloalkyl group with 5-15 carbon atoms, an aryl group with 6-20 carbon atoms or an alkoxy group with 1-20 carbon atoms; or a hydrolysable silyl group, an alkoxycarbonyl group with 2-20 carbon atoms, a trialkylsiloxy carbonyl group with 4-20 carbon atoms, an alkyl carbonyl oxy group with 2-20 carbon atoms, an alkenyl carbonyl oxy group with 3-20 carbon atoms and an oxetanyl group; attached directly or via and jointly with an oxygen atom, a nitrogen atom or a sulphur atom), (B) a polyfunctional acrylic monomer and (C) a photoinitiator.

FUKUYAMA TAKEHIRO (JP)
MASUDA KATSUYUKI (JP)
HIRATA TOMOHIRO (JP)
KOBAYASHI YUUJI (JP)
YASU KATSUHIKO (JP)
NINOMIYA SATOSHI (JP)

PCT/JP2011/054019

September 01, 2011

February 23, 2011

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HITACHI CHEMICAL CO LTD (JP)
FUKUYAMA TAKEHIRO (JP)
MASUDA KATSUYUKI (JP)
HIRATA TOMOHIRO (JP)
KOBAYASHI YUUJI (JP)
YASU KATSUHIKO (JP)
NINOMIYA SATOSHI (JP)

G03F7/033; C08F2/50; C08F32/04; C08F277/00; G03F7/40; H01L21/027

JP2008076860A	2008-04-03
JP2006293094A	2006-10-26
JP2005531680A	2005-10-20
JP2009216728A	2009-09-24

HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)

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