Title:
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF PATTERN FORMING AND ELECTRONIC PART
Document Type and Number:
WIPO Patent Application WO/2007/148384
Kind Code:
A1
Abstract:
A thermostable negative photosensitive resin composition excelling in sensitivity and
resolution; a method of pattern forming in which a pattern of fine configuration excelling
in sensitivity, resolution and heat resistance can be obtained; and a highly
reliable electronic part with a pattern of fine configuration and properties. There
is provided a negative photosensitive resin composition comprising a crosslinking
agent capable of crosslinking or polymerization by the action of an acid, which
crosslinking agent contains a compound having at least one methylol group or
alkoxyalkyl group in each molecule. Preferably, the crosslinking agent capable
of crosslinking or polymerization by the action of an acid is any of compounds of
the general formula: (I) wherein X is a single bond or 1 to 4-valent organic group; each
of R1 and R2 independently is a hydrogen atom or monovalent organic
group; n is an integer of 1 to 4; and each of p and q independently is an integer of
0 to 4.
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Inventors:
MINEGISHI TOMONORI
Application Number:
PCT/JP2006/312358
Publication Date:
December 27, 2007
Filing Date:
June 20, 2006
Export Citation:
Assignee:
HITACHI CHEM DUPONT MICROSYS (JP)
MINEGISHI TOMONORI
MINEGISHI TOMONORI
International Classes:
C08G73/22; C08G73/10; G03F7/004; G03F7/038; H01L21/027
Foreign References:
| JP2003121998A | 2003-04-23 | |||
| JP2002169286A | 2002-06-14 | |||
| JP2001312051A | 2001-11-09 | |||
| JP2000199957A | 2000-07-18 | |||
| JP2006189788A | 2006-07-20 | |||
| JP2006178059A | 2006-07-06 |
Other References:
UEDA M. ET AL.: "A New Negative-Type Photosensitive Polyimide Based on Poly(hydroxyimide), a Cross-Linker, and a Photoacid Generator", MACROMOLECULES, vol. 29, 1996, pages 6427 - 6431, XP000625594
WATANABE Y. ET AL.: "New Negative-Type Photosensitive Alkaline-developtable Semi-aromatic Polyimides with Low Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-Linker, and A Photoacid Generator", POLYMER JOURNAL, vol. 37, no. 4, 2005, pages 270 - 276, XP003002749
WATANABE Y. ET AL.: "Three-Component Negative-Type Photosensitive Polyimide Precursor Based on Poly(amic acid), a Cross-Linker, and a Photoacid Generator", JOURNAL OF POLYMER SCIENCE, PART A: POLYMER CHEMISTRY, vol. 43, no. 3, 2005, pages 593 - 599, XP003002750
WATANABE Y. ET AL.: "New Negative-Type Photosensitive Alkaline-developtable Semi-aromatic Polyimides with Low Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-Linker, and A Photoacid Generator", POLYMER JOURNAL, vol. 37, no. 4, 2005, pages 270 - 276, XP003002749
WATANABE Y. ET AL.: "Three-Component Negative-Type Photosensitive Polyimide Precursor Based on Poly(amic acid), a Cross-Linker, and a Photoacid Generator", JOURNAL OF POLYMER SCIENCE, PART A: POLYMER CHEMISTRY, vol. 43, no. 3, 2005, pages 593 - 599, XP003002750
Attorney, Agent or Firm:
SAKAI, Hiroaki (Kasumigaseki Building2-5, Kasumigaseki 3-chom, Chiyoda-ku Tokyo 19, JP)
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