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Title:
NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/014576
Kind Code:
A1
Abstract:
[Problem] The purpose is to provide a negative radiation-sensitive resin composition which is reduced in bumps in the side wall of a resist pattern or deterioration of the pattern shape due to reflection from a substrate when applied to a substrate having a high reflectance or a substrate that partially has a different reflectance during exposure since there are a plurality of materials on the single substrate. [Solution] A negative radiation-sensitive resin composition of the present invention is characterized by containing (A) an alkali-soluble resin, (B1) at least one kind of radiation-sensitive acid generator that is selected from among the compounds represented by general formula (0), and (C) a crosslinking agent. (In general formula (0), R16-R20 each independently represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-5 carbon atoms, a halogenated alkyl group having 1-5 carbon atoms or a polar group; and M+ represents an onium cation.)

Inventors:
HARADA, Saki (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
原田 早紀 (〒40 東京都港区東新橋一丁目9番2号 JSR株式会社内 Tokyo, 〒1058640, JP)
MIYAKE, Masayuki (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
三宅 正之 (〒40 東京都港区東新橋一丁目9番2号 JSR株式会社内 Tokyo, 〒1058640, JP)
Application Number:
JP2011/063212
Publication Date:
February 02, 2012
Filing Date:
June 09, 2011
Export Citation:
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Assignee:
JSR CORPORATION (9-2 Higashi-Shinbashi 1-chome, Minato-ku Tokyo, 40, 〒1058640, JP)
JSR株式会社 (〒40 東京都港区東新橋一丁目9番2号 Tokyo, 〒1058640, JP)
HARADA, Saki (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
原田 早紀 (〒40 東京都港区東新橋一丁目9番2号 JSR株式会社内 Tokyo, 〒1058640, JP)
MIYAKE, Masayuki (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
International Classes:
G03F7/004; G03F7/038; H01L21/027
Foreign References:
JP2006276688A2006-10-12
JP2006201711A2006-08-03
JP2006091421A2006-04-06
JP2006084924A2006-03-30
JP2006047533A2006-02-16
JP2006251466A2006-09-21
JP2006215271A2006-08-17
JP2008268935A2008-11-06
JP2008112186A2008-05-15
JP2006215180A2006-08-17
JP2006259136A2006-09-28
JP2007140070A2007-06-07
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (Gotanda Yamazaki Bldg. 6F, 13-6 Nishigotanda 7-chome, Shinagawa-k, Tokyo 31, 〒1410031, JP)
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