Title:
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE-TYPE LITHOGRAPHIC PRINTING ORIGINAL PLATE, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2017/056595
Kind Code:
A1
Abstract:
A negative-type photosensitive resin composition containing: a polymer compound that has, in the principal chain thereof, a constituent unit A represented by formula A-1, a constituent unit B which comprises at least one of the constituent units represented by formulas B-1 to B-7, and a constituent unit C having an ethylenic unsaturated group; and a polymerization initiator. An original plate for negative-type lithographic printing that has an image recording layer containing the negative-type photosensitive resin composition. A method for producing a lithographic printing plate that involves, in this order, an exposure step for image-exposing the original plate for negative-type lithographic printing, and a development step for developing by removing the unexposed section of the exposed original plate for negative-type lithographic printing, by using a developing solution.
Inventors:
YASUHARA YUICHI (JP)
NOZAKI ATSUYASU (JP)
NOZAKI ATSUYASU (JP)
Application Number:
PCT/JP2016/068828
Publication Date:
April 06, 2017
Filing Date:
June 24, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F299/02; G03F7/027; G03F7/004; G03F7/029
Domestic Patent References:
| WO2016133072A1 | 2016-08-25 | |||
| WO2015151632A1 | 2015-10-08 |
Foreign References:
| JP2005106910A | 2005-04-21 | |||
| JPH05210241A | 1993-08-20 | |||
| JP2005091703A | 2005-04-07 | |||
| JP2005258070A | 2005-09-22 | |||
| JP2013130726A | 2013-07-04 | |||
| JPH0990638A | 1997-04-04 |
Other References:
See also references of EP 3358408A4
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
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