NETWORK ARCHITECTURE AND PROTOCOL FOR CLUSTER OF LITHOGRAPHY MACHINES

WIPO Patent Application WO/2012/143548

A3

A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit. Each lithography element also comprises a cluster front-end for interface to an operator or host system, the front-end arranged for issuing control information to the at least one element control unit to control operation of the one or more lithography subsystems for exposure of one or more wafers. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

VAN KERVINCK MARCEL NICOLAAS JACOBUS (NL)
DE BOER GUIDO (NL)

PCT/EP2012/057366

December 13, 2012

April 23, 2012

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MAPPER LITHOGRAPHY IP BV (NL)
VAN KERVINCK MARCEL NICOLAAS JACOBUS (NL)
DE BOER GUIDO (NL)

G03F7/20; H01J37/317

US20070219736A1	2007-09-20
US20070142950A1	2007-06-21
EP0507589A2	1992-10-07
US20020120417A1	2002-08-29

MOOIJ, Maarten et al. (HA Amsterdam, NL)

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