Ni-BASED SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM

WIPO Patent Application WO/2016/143858

A1

The present invention addresses the problem of providing an Ni-based sputtering target material in which permeability is low, a strong magnetic flux leakage is obtained, and the usage efficiency in magnetron sputtering is high. In order to solve this problem, this invention provides an Ni-based sputtering target material containing an Fex-Niy-Coz-M-based alloy, wherein the Ni-based sputtering target material is characterized in that: the alloy contains, as element M, a total of 2-20 at% of one or more elements M1 selected from W, Mo, Ta, Cr, V, and Nb and a total of 0-10 at% of one or more element M2 selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru, with the remainder made up of Ni, one or both of Fe and Co, and unavoidable impurities; when x + y + z = 100, x is 0-50, y is 20-98, and z is 0-60; the alloy has a microstructure containing Feα-Niβ-Coγ; when α＋β＋γ = 100, β is 20-35 and γ is 30 or less; and the microstructure contains the element M solid-solved in the Feα-Niβ-Coγ phase, and/or the element M forming a compound with at least one element from among Fe, Ni, and Co.

HASEGAWA HIROYUKI (JP)
MATSUBARA NORIAKI (JP)
SHINMURA YUMEKI (JP)
SAWADA TOSHIYUKI (JP)

PCT/JP2016/057596

September 15, 2016

March 10, 2016

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SANYO SPECIAL STEEL CO LTD (JP)

G11B5/851; C22C19/03; C22C19/07; C23C14/14; C23C14/34; G11B5/738; B22F3/14

JP2012128933A	2012-07-05
JP2013032573A	2013-02-14
JP2012087412A	2012-05-10
JPH06184740A	1994-07-05

NAGAI Hiroshi et al. (JP)
Hiroyuki Nagai (JP)

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