Title:
Ni BASED TARGET MATERIAL WITH EXCELLENT SPUTTERING PROPERTIES
Document Type and Number:
WIPO Patent Application WO/2016/129492
Kind Code:
A1
Abstract:
Provided is an Ni-based alloy sputtering target material having high usage efficiency and low magnetic permeability with which a strong leakage magnetic flux may be obtained, said material containing a (NiX‒FeY‒CoZ)‒M alloy, wherein the Ni based alloy sputtering target material is characterized in that the alloy contains as the element M a total of 2-20 at.% of one or more M1 elements selected from W, Mo, Ta, Cr, V, and Nb, and a total of 0-10 at.% of one or more M2 elements selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru, with the remainder comprising Ni, Fe, Co, and unavoidable impurities; where X + Y + Z = 100, 20 ≤ X ≤ 98, 0 ≤ Y ≤ 50, and 0 ≤ Z ≤ 60; and the alloy has a microstructure having an Ni-M phase as a matrix phase, the microstructure being one in which an Fe phase and/or a Co phase are dispersed within the matrix phase.
Inventors:
UNO MIYUKI (JP)
HASEGAWA HIROYUKI (JP)
HASEGAWA HIROYUKI (JP)
Application Number:
PCT/JP2016/053350
Publication Date:
August 18, 2016
Filing Date:
February 04, 2016
Export Citation:
Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C23C14/34; G11B5/738; G11B5/851; H01F41/18
Foreign References:
| JPH0297636A | 1990-04-10 | |||
| JP2012128933A | 2012-07-05 | |||
| JP2010248603A | 2010-11-04 | |||
| JP2010095794A | 2010-04-30 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
Hiroyuki Nagai (JP)
Hiroyuki Nagai (JP)
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