Title:
NOBLE GROUP IV-B ORGANOMETALLIC COMPOUND, AND METHOD FOR PREPARING SAME
Document Type and Number:
WIPO Patent Application WO/2012/124913
Kind Code:
A2
Abstract:
The present invention relates to a noble group IV-B organometallic compound represented by formula 1 below, and to a method for preparing same, and more particularly, to a group IV-B organometallic compound which is applicable to chemical vapor deposition (CVD) or atomic layer deposition (ALD), and which is thermally and chemically stable, and to a method for preparing same. The group IV-B organometallic compound synthesized according to the present invention is highly volatile and thermally stable, and can thus be advantageously used for the preparation of group IV-B metal oxide films. In formula 1, M is Ti, Zrf or Hf, R1 is an alkyl group of C1-C4, and R2 and R3 are, independently, C1-C6 alkyl groups.
Inventors:
AHN DAE-JUN (KR)
KIM HYUN-CHANG (KR)
KIM HYUN-CHANG (KR)
Application Number:
PCT/KR2012/001566
Publication Date:
September 20, 2012
Filing Date:
March 02, 2012
Export Citation:
Assignee:
MECHARONICS CO LTD (KR)
AHN DAE-JUN (KR)
KIM HYUN-CHANG (KR)
AHN DAE-JUN (KR)
KIM HYUN-CHANG (KR)
International Classes:
C07F7/28; C07F7/00; C23C16/18; H01L21/205
Foreign References:
| EP0416815A2 | 1991-03-13 | |||
| US5026798A | 1991-06-25 | |||
| US20030191334A1 | 2003-10-09 | |||
| JPH08198910A | 1996-08-06 |
Other References:
NIINISTO, J. ET AL.: 'Novel Mixed Alkylamido-Cyclopentadienyl Precursors for ALD of Zr02.' J. MATER. CHEM. vol. 18, 2008, pages 5243 - 5247
Attorney, Agent or Firm:
KIM, Seung-ho (Bundangtechnopark151, Yatap-dong, Bundang-g, Seongnam-si Gyeonggi-do 463-760, KR)
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Claims:
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