Title:
NON-MAGNETIC AMORPHOUS ALLOY, AND SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM USING SAID ALLOY
Document Type and Number:
WIPO Patent Application WO/2017/033936
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a non-magnetic amorphous Co alloy that can prevent the occurrence of crystallization during high-temperature treatment (for example, heat treatment at approximately 400–500°C during magnetic layer formation on a heat-assisted magnetic recording medium); and a sputtering target material and a magnetic recording medium that use the Co alloy. In order to fulfill this purpose, the present invention provides a non-magnetic amorphous alloy that includes: 0 at% to 2 at% inclusive of Fe; 5 at% to 20 at% inclusive of an A group element comprising one or more elements selected from Ti, Zr, and Hf; 16 at% to 50 at% inclusive of a B group element comprising two or more elements selected from Cr, Mo, and W; 0 at% to 25 at% inclusive of a C group element comprising one or more elements selected from V, Nb, and Ta; 0 at% to 20 at% inclusive of a D group element comprising one or more elements selected from Si, Ge, P, B, and C; and a remainder which comprises Co and unavoidable impurities. The sum of the content of the A group element and the content of the B group element is more than 35 at% to 70 at%.
Inventors:
HASEGAWA HIROYUKI (JP)
SHINMURA YUMEKI (JP)
SHINMURA YUMEKI (JP)
Application Number:
PCT/JP2016/074533
Publication Date:
March 02, 2017
Filing Date:
August 23, 2016
Export Citation:
Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
G11B5/738; C23C14/34; G11B5/851
Foreign References:
| JPS62280341A | 1987-12-05 | |||
| JPH0270042A | 1990-03-08 | |||
| JP2007272949A | 2007-10-18 | |||
| JPS5827941A | 1983-02-18 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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