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Title:
NORBORNENE POLYMER
Document Type and Number:
WIPO Patent Application WO/2005/080467
Kind Code:
A1
Abstract:
A norbornene polymer excelling in resistance to thermal distortion and realizing an enhanced balance between low birefringence and mechanical strength. There is provided a norbornene polymer comprising repeating units, the repeating units derived from a norbornene monomer having cyclic hydrocarbon structure (I) derived from norbornene ring constituting at least part of the main chain, C4-C6 cyclic hydrocarbon structure (II) sharing one carbon to carbon bond (a) with the cyclic hydrocarbon structure (I) and monocyclic or polycyclic hydrocarbon structure (III) sharing at least one carbon to carbon bond other than the carbon to carbon bond (a) with the cyclic hydrocarbon structure (II), in a proportion of 20 to 100 mol% based on all the repeating units, wherein in 13C-NMR, the ratio of peak area on high magnetic field side (A) to peak area on low magnetic field side (B) with respect to methylene peaks ascribed to the cyclic hydrocarbon structure (III) satisfies the relationship B/(A+B) ≤ 0.3, and whose Mn and Mw are in the range of 18,000 to 28,000 and 20,000 to 42,000, respectively.

Inventors:
Miyagawa, Yoshinori c/o Zeon Corporation (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo, 100-8323, JP)
Komatsu, Masaaki c/o Zeon Corporation (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo, 100-8323, JP)
Application Number:
PCT/JP2005/001965
Publication Date:
September 01, 2005
Filing Date:
February 09, 2005
Export Citation:
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Assignee:
ZEON CORPORATION (6-1 Marunouchi 2-chome, Chiyoda-ku, Tokyo, 100-8323, JP)
Miyagawa, Yoshinori c/o Zeon Corporation (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo, 100-8323, JP)
Komatsu, Masaaki c/o Zeon Corporation (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo, 100-8323, JP)
International Classes:
C08F32/08; C08G61/08; (IPC1-7): C08G61/08; C08F32/08
Domestic Patent References:
WO1999009085A1
Foreign References:
JPH0741550A
JPH0753680A
JPH02255715A
JPH06248164A
Attorney, Agent or Firm:
Sakai, Hiroaki (Sakai International Patent Office, Kasumigaseki Building 2-5, Kasumigaseki 3-chom, Chiyoda-ku Tokyo, 100-6019, JP)
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