NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER, AND FUNCTIONAL RESIN COMPOSITION CONTAINING SAME

WIPO Patent Application WO/2016/125782

A1

As a chemically amplified resist, the present invention provides a resist and compound having a good balance by which line edge roughness (LER) is improved without impairing basic physical properties inherent in a resist, such as base adhesion properties and resistance to dry etching. Provided are a lactone ester compound represented by general formula (1), a method for producing same, a (meth)acrylic copolymer comprising general formula (1), and a photosensitive resin composition containing same. (In formula (1): R1 denotes a hydrogen atom or a methyl group; R2 denotes a hydrogen atom, an aliphatic alkyl group having 1-10 carbon atoms or an alkyl group having an alicyclic structure having 3-10 carbon atoms; R3 denotes a hydrogen atom, an alkoxycarbonyl group represented by formula (2), an aliphatic alkyl group having 1-10 carbon atoms or an alkyl group having an alicyclic structure having 3-10 carbon atoms; here, R2 and R3 may bond to each other to form an alicyclic structure having 3-10 carbon atoms; and n1 is an integer between 0 and 2.) (In formula (2): R4 denotes an aliphatic alkyl group having 1-13 carbon atoms or an alkyl group having an alicyclic structure having 3-13 carbon atoms; and the dotted line denotes the bonding location in the compound represented by formula (1).)

TANAGI HIROYUKI (JP)
TANAKA HIROYASU (JP)
MIZUSAKA TETSUHIKO (JP)
FURUKAWA KIKUO (JP)
HORIKOSHI HIROSHI (JP)

PCT/JP2016/053035

August 11, 2016

February 02, 2016

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MITSUBISHI GAS CHEMICAL CO (JP)

C08F20/28; C07D307/33; C07D307/94; G03F7/039; G03F7/20

WO2015016027A1

2015-02-05

JP2014013413A	2014-01-23
JP2015007781A	2015-01-15
JP2007241108A	2007-09-20
JP2007156450A	2007-06-21

KOBAYASHI Hiroshi et al. (JP)
Kobayashi 浩 (JP)

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