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Title:
NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR CONTAINING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
Document Type and Number:
WIPO Patent Application WO/2019/168089
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novel compound which absorbs long-wavelength active energy rays and generates with high-efficiency radicals and strong bases, and which has excellent reaction efficiency in a base generating chain reaction; a photopolymerization initiator which contains said compound; and a photosensitive resin composition which contains said photopolymerization initiator. This novel compound is represented by formula (1). (In formula (1), R1, R2, R3, R5 and R6 independently represent a hydroxyl group, an alkoxy group, or an organic group other than those substituents. The R4's independently represent an organic group including a thioether bond. 'A' represents a substituent represented by formula (1-1) or (1-2). (In formula (1-1), R7 and R8 independently represent a hydrogen atom, an alkyl group or a heterocyclic group. In formula (1-2), R9 and R10 independently represent an amino group or a substituted amino group.))

Inventors:
TERADA Kiwamu (31-12 Shimo 3-chome, Kita-k, Tokyo 88, 〒1158588, JP)
KUWABARA Hirokazu (31-12 Shimo 3-chome, Kita-k, Tokyo 88, 〒1158588, JP)
Application Number:
JP2019/007775
Publication Date:
September 06, 2019
Filing Date:
February 28, 2019
Export Citation:
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Assignee:
NIPPON KAYAKU KABUSHIKI KAISHA (1-1 Marunouchi 2-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
International Classes:
C07C323/22; C07D213/75; C07D213/85; C07D295/205; C08F2/50
Domestic Patent References:
WO2017099130A12017-06-15
WO1997031033A11997-08-28
WO2017141723A12017-08-24
WO2018207836A12018-11-15
Foreign References:
KR20130066483A2013-06-20
KR20060053095A2006-05-19
JP2012180310A2012-09-20
JP2011190241A2011-09-29
Other References:
TERADA, TSUTOMU ET AL.: "UV Hard Coat Material Using Benzoin Derivative Generating Amine and Radical as a Photobase Generator", POLYMER PREPRINTS, vol. 66, no. 2, Japan
TERADA, TSUTOMU ET AL.: "Development of photobase generator generating amine and radical and its application to hard coat material", POLYMER PREPRINTS, vol. 66, no. 1, 2017, Japan
ISHIKAWA, N. ET AL.: "Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 27, no. 2, 2014, pages 223 - 225, XP055585977, doi:10.2494/photopolymer.27.223
ISHIKAWA, N. ET AL.: "Development of Photobase Generator with Benzoin Derivatives and Its Application to Photosensitive Materials", CHEMISTRY LETTERS, vol. 43, no. 5, 2014, pages 612 - 614, XP055634763, ISSN: 0366-7022, DOI: 10.1246/cl.131148
ARIMITSU, KOJI ET AL.: "Synthesis of a Novel Photobase Generator Having a Base-Proliferating Group and its Application to a Negative-Type Photopolymer", KOBUNSHI RONBUNSHU, vol. 71, no. 2, 2014, pages 53 - 58, XP055634771
ZHANG, X. ET AL.: "Visible-Light-Initiated Thiol- Michael Addition Polymerizations with Coumarin- Based Photobase Generators: Another Photoclick Reaction Strategy", ACS MACRO LETTERS, vol. 5, no. 2, 2016, pages 229 - 233, XP055634776, DOI: 10.1021/acsmacrolett.5b00923
Attorney, Agent or Firm:
KAMIMURA Yoichiro (9F E/Fornt bldg, 3-11 Kandaogawamachi Chiyoda-k, Tokyo 52, 〒1010052, JP)
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